DI Water vs. Ultra-Pure Water: Why MiraSAT Uses Ultra-Pure Water for Cleaning High Vacuum Chambers in the Semiconductor Industry

Date: 10/11/2024     By: 59Clean

In the semiconductor industry, the importance of maintaining a pristine, contaminant-free environment cannot be overstated, particularly when it comes to cleaning high vacuum chambers. Any trace of contamination can disrupt sensitive manufacturing processes, leading to defects in wafers and costly production issues. The choice of cleaning materials plays a critical role in this process, especially the water used in pre-saturated wipers, such as Foamtec’s MiraSAT Wipers.

When deciding between deionized (DI) water and ultra-pure water (UPW) for cleaning applications, it’s essential to understand the differences between the two, and why MiraSAT Wipers opt for UPW to deliver the best results in demanding semiconductor environments.

What is DI Water?

Deionized water is produced by passing water through an ion-exchange process, which removes dissolved mineral salts and ions. This level of purification makes DI water effective for a variety of cleaning applications, particularly where ionic contaminants need to be minimized. However, DI water still may contain organic compounds, microorganisms, or particulates that could be problematic in ultra-clean environments like high vacuum chambers.

What is Ultra-Pure Water?

Ultra-pure water (UPW) takes purification to the highest level. Beyond removing ions, UPW is filtered to remove particulates, dissolved gases, and organic molecules, resulting in water that meets the strictest purity standards, often used in semiconductor fabrication. UPW is virtually free of any impurities, with total organic carbon (TOC) levels measured in parts per billion (ppb) and conductivity in the range of 0.055 µS/cm, making it the cleanest water available.

Why Ultra-Pure Water is Better for Cleaning High Vacuum Chambers

1. Superior Contaminant Control: In semiconductor fabrication, even the smallest amount of contamination can cause serious defects in wafers. High vacuum chambers are sensitive to any particles, ions, or organic contaminants that may interfere with the process. UPW, due to its extremely high purity, minimizes the risk of introducing contaminants during cleaning, ensuring a cleaner environment for critical semiconductor processes.

2. Minimizes Particle Generation: High vacuum chambers are vulnerable to particle contamination, which can lead to issues like deposition defects or surface imperfections. Ultra-pure water’s low particulate content ensures that no additional particles are introduced during cleaning, reducing the risk of contamination.

3. No Residue Formation: Unlike DI water, UPW is free from dissolved gases and organic compounds, which means it leaves no residue behind during evaporation. This is critical for vacuum chambers, as residue can interfere with processes and lead to the need for additional cleaning or maintenance.

Why MiraSAT Wipers Use Ultra-Pure Water

Foamtec’s MiraSAT Wipers are pre-saturated with ultra-pure water for a reason: to provide the cleanest, most efficient cleaning solution for high vacuum chambers in semiconductor manufacturing. Here’s why UPW is the superior choice for MiraSAT:

- Optimal Particle Removal: MiraSAT Wipers are designed to effectively remove contaminants from surfaces without reintroducing particles or residues. By using ultra-pure water, these wipers ensure that no contaminants are left behind, supporting the stringent cleanliness standards required in high vacuum chambers.

- No Ionic Contamination: UPW ensures that no ionic residues are introduced during the cleaning process, preventing potential contamination that could disrupt the sensitive processes inside vacuum chambers.

- Maximizing Yield: Using UPW in pre-saturated wipers like MiraSAT helps semiconductor manufacturers maintain cleaner chambers, reduce defect rates, and improve yields. This ultimately leads to higher quality products and fewer process interruptions.

Conclusion

While DI water is a suitable option for many general cleaning applications, it simply does not meet the extreme purity standards required for cleaning high vacuum chambers in semiconductor manufacturing. Ultra-pure water is the superior choice, offering unmatched contaminant control, particle removal, and process consistency. Foamtec’s MiraSAT Wipers, pre-saturated with ultra-pure water, are specifically designed to support the demanding requirements of the semiconductor industry, ensuring a cleaner and more efficient cleaning process for high vacuum chambers.

MiraSAT Product Info: https://www.59clean.com.tw/en/html/product/show.php?pid=238&cid=93&cid2=91